
Application directioon
Tetraethoxysilane is widely used in chemical vapor deposition (CVDI processes toform silica deposition films, which block contaminants and impurities fromentering semiconductor components. It can also produce conductive orinsulating layers,create anti-reflective cootinas to improve light absorption,and serve as a temporary etching barrier. It is an essential elecironicchemical for the manufacturing of semiconductors, discrete devices, and
microelecromechanical systems (MEMS).
Package storage and transportation
19Okg steel drum. Keep container closed. Store at cool, dry and well-ventilated places. Keep away from flame and direci sunlight. Avoid rain and blazing sun during transportation The shelf life is 12 months
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