
Application direction
Tetraethoxysilane is widely used in chemical vapor deposition (CVDI processes to form silica deposition films, which block contaminants and impurities from entering semiconductor components. It can also produce conductive or insulating layers,create anti-reflective cootinas to improve light absorption,and serve as a temporary etching barrier. It is an essential electronic chemical for the manufacturing of semiconductors, discrete devices, and
microelecromechanical systems (MEMS).
Package storage and transportation
19Okg steel drum. Keep container closed. Store at cool, dry and well-ventilated places. Keep away from flame and direct sunlight. Avoid rain and blazing sun during transportation The shelf life is 12 months
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